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Improving reliability of quantum device components made using electron beam lithography

Paper Authors:

A. M. Rebello,

L. M. Ruela,

G. Moreto,

N. Y. Klein,

E. Martins,

I. S. Oliveira,

F. Rouxinol,

J. P. Sinnecker

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Key Details

Josephson junction reproducibility is a hindrance to quantum technology performance and scaling

30kV electron beam lithography allows lower-cost fabrication but is very sensitive

Simulating electron scattering provides insights on backscattered electron behavior

Strategic junction geometry selection can improve dose distribution homogeneity

More even dose distribution significantly enhances fabrication reproducibility

AI generated summary

Improving reliability of quantum device components made using electron beam lithography

Researchers explore methods to make Josephson junctions, which are important for quantum computers, more reliably using a 30kV electron beam lithography technique. By analyzing electron scattering and simulating different junction geometries, they find some designs distribute dose more evenly, improving reproducibility.

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